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Metryx Mentor


Mentor is a new generation of metrology tool based on innovative weighing technology.

M ass and density are fundamental properties of almost all deposited materials used in the semiconductor industry.

The Mentor utilizes advanced compensation algorithms that improve weighing accuracy by an order of magnitude compared with previous techniques. Almost any process that results in a change in weight of the substrate can benefit from the tool.

All measurements are non-contact and non-destructive. Product wafers can be measured directly or test wafers can be shared with other metrology tools.

Fast, accurate and simple to use

Analysis times are fast. Throughputs of 75 wph ensure in-line compatibility. The Mentor offers fully automatic cassette-cassette operation using industry standard 200 and 300mm open cassettes to allow measurements of the wafers before and after processing.

Sophisticated control of ambient conditions is fully automatic and provides weighing capability to the required level of <0.04mg needed to detect density changes in the range of 0.01g/cm 3 .

Metryx Mentor - a new generation of metrology tool The system is controlled via an SGVA Touchscreen with simple to use software that can be fully integrated to the fab communications network e.g. SECS11/GEM.

Ideal for non-contact, non-destructive measurements
on production wafers


For low k determinations, alternative approaches are generally slow and require either test wafers or risk contamination (eg Hg dots)

Metal film analyses pose similar problems because they use resistivity measurements involving 4 point probes cause wafer damage.

Metryx Mentor measures production wafers as standard.

The tool is sensitive enough to distinguish k variations from small changes in deposition parameters. It can also determine the anneal state in Copper films not detectable by other methods.
Mentor wafer handling

Applications

Low k dielectrics
Accurate determination of k variations.

Metal films
Thickness measurements to atomic resolution for barrier layers.

Other application areas include:

- CMP
- Step coverage
- Out-gassing of moisture/solvents
- Factory-wide SPC